3:45 PM - 4:00 PM
△ [18p-B11-10] Fabrication of Y2O3/Ge pMOSFETs through clean Ge surface
Keywords:germanium, interface
Oral presentation
13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies
Wed. Sep 18, 2019 1:15 PM - 5:00 PM B11 (B11)
Masaharu Kobayashi(Univ. of Tokyo), Shinji Migita(AIST), Hitoshi Wakabayashi(Tokyo Tech)
3:45 PM - 4:00 PM
Keywords:germanium, interface