Nanoparticle formation on ZnO thin film by laser effect during RF sputtering

Wataru Wakaki; Akio Sanpei; Noriyuki Hasuike; Susumu Kamoi; Haruhiko Himura

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 18, 2019 1:45 PM - 5:15 PM C309 (C309)

Akihisa Ogino(Shizuoka Univ.), Shota Nunomura(AIST)

5:00 PM - 5:15 PM

△ [18p-C309-13] Nanoparticle formation on ZnO thin film by laser effect during RF sputtering

〇(M2)Wataru Wakaki¹, Akio Sanpei¹, Noriyuki Hasuike¹, Susumu Kamoi², Haruhiko Himura¹ (1.Kyoto Inst. of Tech., 2.Kyoto Pre. Tech. Center)

Keywords:zinc oxide, sputtering, laser

We have previously reported nanoparticles formation on ZnO thin films with laser during RF sputtering. However, the physical phenomenon of nanoparticle formation have not been elucidated yet. Here, we report the observation of oxygen flow rate dependence of ZnO nanoparticles.