The 80th JSAP Autumn Meeting 2019

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Joint Session M » 22.1 Joint Session M "Phonon Engineering"

[18p-E214-1~13] 22.1 Joint Session M "Phonon Engineering"

Wed. Sep 18, 2019 1:15 PM - 5:00 PM E214 (E214)

Yoshiaki Nakamura(Osaka Univ.), Junichiro Shiomi(Univ. of Tokyo), Toshio Baba(JST)

1:15 PM - 1:30 PM

△ [18p-E214-1] Evaluation of Thermal Conductivity Characteristics in SOI Film Covered with Different Process Oxide Film by Raman Spectroscopy

〇Haruki Takeuchi1, Ryo Yokogawa1,2, Motohiro Tomita3, Takanobu Watanabe3, Atsushi Ogura1 (1.Meiji Univ., 2.JSPS Research Fellow DC, 3.Waseda Univ.)

Keywords:thermoelectric material, Phonon, Silicon oxide film