Stress Evaluation of Wiggling SiN Pattern by using Raman Spectroscopy

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Wed. Sep 18, 2019 1:45 PM - 4:15 PM E304 (E304)

Hiroshi Ikenoue(Kyushu Univ.), Hitoshi Habuka(Yokohama Natl. Univ.)

3:15 PM - 3:30 PM

〇(M1)Masato Koharada¹, Ryo Yokogawa^1,2, Naomi Sawamoto¹, Kazutoshi Yoshioka¹, Atsushi Ogura¹ (1.Meiji Univ., 2.JSPS Research Fellow DC)

Keywords:Raman Spectroscopy