[18p-F211-1~6] 8.6 Plasma Electronics English Session

▲ [18p-F211-1] [INVITED] INCA: A new scalable large area plasma source at low pressures

〇Tsanko Vaskov Tsankov¹、Philipp Ahr¹、Uwe Czarnetzki¹ (1.Ruhr University Bochum)

キーワード：large area plasma processing, low pressure plasma source, ICP

A new planar, large area plasma source operating at low pressures of a few Pa and below is introduced. The electron heating mechanism of the source is based on a novel collisonless heating concept which involves an array of electric vortex fields. This coins the name INCA as the acronym of Inductively Coupled Array. Possible applications are in large area processing or for large area plasma thrusters.The performance of the source will be introduced, the parameter scaling explained, and the theory behind the new heating mechanism outlined.