[19a-E304-1~12] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-E304-4] Fabrication of piezoresistive pressure sensor using minimal deep-RIE and mask aligner

〇Yongxun Liu¹, Hiroyuki Tanaka^1,2, Kazuhiro Koga², Kazumasa Nemoto¹, Sommawan Khumpuang^1,2, Masayoshi Nagao¹, Takashi Matsukawa¹, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

Keywords:Minimal-fab