[19a-E304-1~12] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-E304-9] Fine Patterning on Roll Surface Using Photolithography for Frosted Aluminum Plate

Hideto Yuge¹, Hiroaki Suzuki¹, 〇Minoru Sasaki¹ (1.Toyota Technol. Inst.)

Keywords:micro/nano-patterning, rolling, 3-dimensional photolithography

The mechanical- or laser-machining has been used for making dimples or reliefs on the roller surface for texturing. However, since these methods are single point machining, the finer the pattern the smaller the machining area. The expanding processing time actually limits the applications. Here, a new technique of 3-dimensionl photolithography is introduced. The conventional photolithography is only effective to the planer sample. Newly introduced is a sheet. On that, the photoresist is spin-coated and the patterning is finished. Then, this sheet is pasted on the roller surface. After dissolving the base sheet layer and the subsequent development of the resist, the resist pattern is obtained. The wet etching of the roller steel gives the fine relief. The designed 6 convex ring arrays are obtained. The ring outer diameters are 26-76 mm and their array pitches are 28-84 mm in design realizing the fine patterns. The pattern transfer from the roller to the aluminum plate is confirmed.