[19a-E308-1~9] 17.3 Layered materials

[19a-E308-1] Sheet-Resistance Reduction of Sputtered-MoS₂ Film by SF₆ Plasma Treatment

〇Taiga Horiguchi¹, Takuya Hamada¹, Tetsuya Tatsumi², Shigetaka Tomiya², Takuya Hoshii¹, Kuniyuki Kakushima¹, Kazuo Tsutsui³, Hitoshi Wakabayashi^1,2 (1.School of Engineering, Tokyo Tech, 2.Research Institute of the Earth Inclusive Sensing, Tokyo Tech, 3.IIR, Tokyo Tech)

Keywords:transition metal dichalcogenide, MoS2, Plasma