The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[19a-N304-1~10] 3.7 Laser processing

Thu. Sep 19, 2019 9:00 AM - 11:45 AM N304 (N304)

Yoshie Ishikawa(AIST), Masayuki Kakehata(AIST)

9:15 AM - 9:30 AM

[19a-N304-2] Abrasion and heat resistance improvements of SiO2 film formed by F2 laser induced photocchemical surface modification of silicone coated film on polycarbonate

Hidetoshi Nojiri1, Masayuki Okoshi2 (1.RENIAS, 2.National Defense Academy)

Keywords:photochemical modification, F2 laser, silicone

To manufacture an automotive resin window, we have been considering wet silicone coating on polycarbonate (PC) and its photochemical modification by F2 laser irradiation. To suppress cracking in modified SiO2 film, mesh mask was set on the silicone coated surface and F2 laser was irradiated through the mesh mask. Then the distance d between mesh mask and silicone surface was changed from 0 mm to 20 mm. After laser irradiation, Taber abrasion test was done at 1000 cycle and delta haze (ΔH1000) was measured. As increasing laser irradiation time, ΔH1000 was decrease once and then increased. But when d was 20 mm, low ΔH1000 was indicated at the all laser irradiation time. And heat resistance was also improved at d=20 mm. These improvement of mechanical properties were believed to be the result of reducing stress in the SiO2 film.