The 80th JSAP Autumn Meeting 2019

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[19p-E305-1~15] 13.3 Insulator technology

Thu. Sep 19, 2019 1:45 PM - 5:45 PM E305 (E305)

Toshifumi Irisawa(AIST), Kiyoteru Kobayashi(Tokai Univ.)

3:30 PM - 3:45 PM

[19p-E305-8] Formation of Yttrium Silicate Thin Layer by Atomic Layer Deposition

〇Atsuhiro Ohta1, Jinhan Song1, Takuya Hoshii1, Hitoshi Wakabayashi1, Kazuo Tsutsui2, Kuniyuki Kakushima1 (1.Tokyo Tech. school of Eng., 2.Tokyo Tech. IIR)

Keywords:atomic layer deposition, yttrium silicate