The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[20a-B11-1~10] 8.1 Plasma production and diagnostics

Fri. Sep 20, 2019 9:00 AM - 11:45 AM B11 (B11)

Yoshinobu Matsuda(Nagasaki Univ.)

9:15 AM - 9:30 AM

[20a-B11-2] The excited-state distribution analysis of the low-pressure microwave discharge argon plasma for electron energy distribution function diagnosis by optical emission spectroscopic measurement

Yuya Yamashita1, Hiroshi Akatsuka2 (1.TIRI, 2.Tokyo Tech)

Keywords:excitation-kinetic model, collisional-radiative model, electron energy distribution function

The EEDF diagnosis by optical emission spectroscopic measurement is required. In this study, we analyzed the electron energy distribution function (EEDF) dependence of the excited-state distribution. This study is focused on the 2.45GHz low-pressure microwave discharge argon plasma. We measured the EEDF by Langmuir probe based on Druyvesteyn´s method. We evaluated the equivalent electron temperature Te and electron density Ne. And, we analyzed the excited-state distribution based on collisional-radiative model. We evaluated under the EEDFs: the measured EEDF, Maxwellian and Druyvesteynian which had equivalent Te and Ne to the probe measurement values, respectively. We found that the levels between the level 3d´[3/2]o2+ [5/2]o2,3 the level 16´ (Racah symbol) were higher dependency then the other levels.