The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-B31-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Fri. Sep 20, 2019 9:00 AM - 12:15 PM B31 (B31)

Yukiharu Uraoka(NAIST), Keisuke Ide(Tokyo Tech)

10:45 AM - 11:00 AM

[20a-B31-7] Degradation phenomenon of reliability in high mobility oxide thin-film transistor

Takanori Takahashi1, Mami N. Fujii1, Miki Miyanaga2, Juan Paolo Bermundo1, Yasuaki Ishikawa1, Yukiharu Uraoka1 (1.NAIST, 2.Sumitomo Electric Industries, Ltd.)

Keywords:oxide semiconductor, thin-film transistor, reliability

本研究では高移動度酸化物半導体In-W-Zn-Oを用いた薄膜トランジスタの直流および交流電圧による駆動時において、発光現象を伴う特異な信頼性劣化現象を観測した。