[20a-C310-1~12] 6.4 Thin films and New materials

[20a-C310-5] Sputtered chromium oxide thin films prepared by spraying water vapor
toward substrate surface

〇Fan Wang¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kimu¹, Takayuki Kiba¹ (1.Kitami Inst.Tech)

Keywords:chromium oxide, High-rate deposition, water vapor sputtering

We reported at the last year`s JSAP that high-rate deposition of chromium oxide thin films was realized by water vapor sputtering.In this study,we investigated the effects of the supply direction of water vapor that was injected toward the target surface and the substrate surface.As a result,higher depostion rates and gradual composition charge of chromium oxide films were observed when water vapor was injected toward the substrate surface.