The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[20a-C310-1~12] 6.4 Thin films and New materials

Fri. Sep 20, 2019 9:00 AM - 12:15 PM C310 (C310)

Yuji Muraoka(Okayama Univ.), Nobuyuki Iwata(Nihon Univ.)

10:30 AM - 10:45 AM

[20a-C310-7] Influence of Ta2O5 protective film on electrochromic properties of NiOx thin film in Nafion electrolyte

Chihiro Nakai1, Yoshio Abe1, Midori Kawamura1, Kyung Ho Kim1, Takayuki Kiba1 (1.Kitami Inst. Tech.)

Keywords:electrochromic, protective film, electrolyte

A Ta2O5 protective film was laminated on a NiOx thin film using reactive sputtering method. The effect of the dissolution prevention of the NiOx thin film in an electrolytic solution and its EC characteristics were evaluated. By laminating the protective film, the dissolution of the NiOx thin film was prevented and the cycle durability was improved as compared with the NiOx thin film without the protective film. In addition, the color change of the NiOx thin film was also confirmed. Since the film thickness of the Ta2O5 thin film was as thin as 10 nm, it is considered that sufficient ion diffusion to the NiOx thin film occurs.