The 80th JSAP Autumn Meeting 2019

Presentation information

Poster presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA4 (PA)

9:30 AM - 11:30 AM

[20a-PA4-2] Local synthesis of DLC thin films by atmospheric pressure μ plasma jet.

〇(B)Ryota Nishimura1, Hiroyuki Yoshiki1 (1.National Institute of Technology, Tsuruoka College)

Keywords:atmospheric-pressure microplasma, DLC films, Plasma CVD

Diamond-like carbon (DLC) films have attracted much attention because of its large hardness, excellent wear resistance, and high lubricant. In this research project, setting the primary target for application to micromachines and MEMS, DLC films were locally synthesised at 1 atm by using atmospheric pressure μ plasma. By controlling He/CH4/H2 gas composition, and plasma input power, and deposition temperatre as plasma-parameters, DLC films with film hardness of 16 GPa, and 10-20% of sp³ bonds of hydrocarbon were obtained from the results of FT-IR and Raman spectroscopy.