[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

▲ [20a-PA4-5] Morphological Characterization of RF Magnetron Sputtered Zinc Oxide Thin Films-Laser Assisted

〇(M2)Edrick Abu Saidu¹, Akio Sanpei¹, Wataru Wakaki¹, Yasuaki Hayashi¹, Haruhiko Himura¹ (1.Kyoto Inst. of Tech.)

Keywords:RF Magnetron Sputtering, Zinc Oxide, Laser irradiation

In this work, ZnO thin films were deposited on a-sapphire, c-sapphire and synthetic quartz substrates at different laser irradiation times (i.e. 0 mins, 15mins & 30mins) and at varying magnetic field strengths (i.e. B=0 Gauss, B=167 Gauss & B=1200 Gauss). The surface morphologies and compositions of the ZnO thin films were analyzed using scanning electron microscopy. The microstructural parameters, such as the particle number density and crystallite average diameter were calculated. Variation in the surface morphology of the thin films due to laser irradiation was observed. The surface morphological features of the laser irradiated films revealed the presence of crystalline grain size. UV-Vis spectroscopy was also used to investigate the optical properties of the ZnO thin films.