The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[20p-B11-1~12] 8.1 Plasma production and diagnostics

Fri. Sep 20, 2019 1:15 PM - 5:15 PM B11 (B11)

Shusuke Nishiyama(Hokkaido Univ.), Mineo Hiramatsu(Meijo Univ.)

2:30 PM - 2:45 PM

[20p-B11-3] Measurement of negative ions using retarding field energy analyzer with magnetic filter

Yoshinobu Matsuda1, Masaki Ishiba1, Shu Yasumoto1, Tomohiro Furusato1, Takahiko Yamashita1 (1.Nagasaki Univ.)

Keywords:retarding field energy analyser, ion energy distribution, magnetron sputtering

In order to understand the substrate incident ion energy distribution in sputtering deposition of metal-doped ZnO target, we developed a multigrid reflection field energy analyzer (RFEA) with a magnetic filter and investigated its basic operating characteristics. In DC magnetron discharge, it was confirmed that high energy negative ions corresponding to the DC voltage applied to the target were incident on the substrate.