2019年第80回応用物理学会秋季学術講演会

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10 スピントロニクス・マグネティクス » 10.2 スピン基盤技術・萌芽的デバイス技術

[20p-E216-8~20] 10.2 スピン基盤技術・萌芽的デバイス技術

2019年9月20日(金) 15:30 〜 19:00 E216 (E216)

三輪 真嗣(東大)、大兼 幹彦(東北大)

15:45 〜 16:00

[20p-E216-9] Control of crystal orientation of non-collinear antiferromagnetic Mn3Sn thin films prepared by sputtering

〇(M1)Juyoung Yoon1、Yutaro Takeuchi1、Ryuichi Itoh1、Shun Kanai1、Shunsuke Fukami1、Hideo Ohno1 (1.Tohoku Univ.)

キーワード:Spintronics, non-collinear antiferromagnet

Noncollinear antiferromagnetic materials with Kagome lattice have recently attracted much attention as they exhibit large anomalous Hall effect (AHE) originating in the Berry curvature mediated by the noncollinear spin structures. To construct functional devices, controllable crystal orientation film growth technique is required.
Here we prepare Mn3Sn thin films while changing several parameters such as substrate, underlayer, and annealing temperature, and investigate the correlation between their crystal structure and magnetic/transport properties.
We succeeded in preparing thin films with various orientations.