The 80th JSAP Autumn Meeting 2019

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Symposium (Oral)

Symposium (technical) » Latest trend on atomic layer processes

[20p-N304-1~10] Latest trend on atomic layer processes

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Kazuhiro Karahashi(Osaka univ.)

2:30 PM - 3:00 PM

[20p-N304-3] The next generation way of the process control of the atomic layer deposition

〇Tadashi Mitsunari1,2, Toshiki Sato1, Yusuke Suzuki1, Michitaka Kikuchi1, Munehito Kagaya1, Yoshinori Morisada1, Hitoshi Yonemichi3, Hironori Moki3, Tsuyoshi Moriya1 (1.Tokyo Electron Technology Solutions Ltd., 2.Center for Low-temperature plasma Sciences, 3.Tokyo Electron Ltd.)

Keywords:Atomic layer deposition