The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

[21a-C309-1~13] 6.1 Ferroelectric thin films

Sat. Sep 21, 2019 9:00 AM - 12:30 PM C309 (C309)

Hironori Fujisawa(Univ. of Hyogo), Takao Shimizu(Tokyo Tech)

12:00 PM - 12:15 PM

[21a-C309-12] Defect tolerant nature of shift current as revealed by photocurrent action spectra

〇(M2)Hiroki Hatada1, Masao Nakamura2,3, Yoshio Kaneko2, Masato Sotome2, Naoki Ogawa2,3, Yoshinori Tokura1,2, Masashi Kawasaki1,2 (1.Univ. of Tokyo, 2.RIKEN-CEMS, 3.JST-PRESTO)

Keywords:shift-current, photovoltaic effect, ferroelectric material

Crystals with broken inversion symmetry, as exemplified by ferroelectric materials, are known to show photovoltaic effect. Recently, the origin of this effect is theoretically revealed to be so-called the shift current. Shift current of topological origin is expected to be insensitive to impurity and/or defect scatterings, which is in stark contrast with conventional photocurrent driven by electric field. In this study, we experimentally demonstrated the defect tolerant nature of shift current using a typical ferroelectric semiconductor SbSI. First, we revealed that shift current is almost constant even though samples show significant variation in dark conductance one by one. We also revealed that action spectrum with external bias is strongly affected by the surface recombination, whereas that without bias is not. These results clearly indicate the robustness of shift current against impurity, defect and surface recombination.