2019年第80回応用物理学会秋季学術講演会

講演情報

一般セッション(ポスター講演)

17 ナノカーボン » 17 ナノカーボン(ポスター)

[21a-PB1-1~86] 17 ナノカーボン(ポスター)

2019年9月21日(土) 09:30 〜 11:30 PB1 (第二体育館)

09:30 〜 11:30

[21a-PB1-53] Chemical Concentration Dependence of MoCl5 Intercalation to Bilayer Graphene

〇(D)EKKAPHOP KETSOMBUN1、XIANGYU WU3,4、INGE ASSELBERGHS4、SWATI ACHRA3,4、CEDRIC HUYGHEBAERT4、DENNIS LIN4、ZSOLT TOKEI4、KAZUYOSHI UENO1,2 (1.Shibaura Institute of Tech.、2.SIT-RCGI、3.KU Leuven、4.imec)

キーワード:Bilayer Graphene, MoCl5 intercalation, Chemical Concentration

Efficient doping method is required to reduce the resistance of graphene interconnects. This paper proposes a MoCl5 intercalation process for doping CVD graphene at a low-temperature using the 1/2 reduced concentration of MoCl5 chemicals from our previous study. Bilayer graphene (BLG) was not intercalated at 150ºC with using the 1/2 reduced chemicals. However, BLG was intercalated by raising the temperature to 175ºC. Although serious damage was observed with the high concentration, the damage was suppressed with the reduced chemicals. The optimized condition (reduced chemicals at 175ºC) is considered as more appropriate for doping narrow graphene interconnects.