The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[21p-E301-1~7] 13.7 Compound and power electron devices and process technology

Sat. Sep 21, 2019 1:45 PM - 3:30 PM E301 (E301)

Taketomo Sato(Hokkaido Univ.)

2:00 PM - 2:15 PM

[21p-E301-2] Resistance of β-Ga2O3 Schottky Barrier Diodes to Electron-Beam Irradiation

Chiahung Lin1, Akinori Takeyama2, Yohei Yuda3, Tatsuro Watahiki3, Hisashi Murakami4, Yoshinao Kumagai4, Takeshi Ohshima2, Masataka Higashiwaki1 (1.NICT, 2.QST, 3.Mitsubishi Electric Corp., 4.Tokyo Univ. of Agri. & Tech.)

Keywords:Ga2O3, Schottky barrier diode

Ultrawide bandgap semiconductors are expected to have high radiation tolerance owing to their strong
bond strengths and are thus promising for the fabrication of robust electronic devices to be deployed in space missions and nuclear power plants where multiple types of radiation are present. In this work, we investigated the performance of β-Ga2O3 vertical Schottky barrier diodes (SBDs) before and after
electron-beam irradiation up to a cumulative fluence of 1×1016 cm-2.