The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[21p-E310-1~12] 15.4 III-V-group nitride crystals

Sat. Sep 21, 2019 12:45 PM - 4:00 PM E310 (E310)

Atsushi Kobayashi(Univ. of Tokyo), Koichi Naniwae(USHIO OPTO SEMICONDUCTORS, INC.)

1:00 PM - 1:15 PM

[21p-E310-2] - Laser Induced Ohmic Contact Formation(LOC) - Laser-induced High Performance Local Ohmic Electrode Formation for Vertical GaN Devices

Teruhisa Kawasaki1, Noriko Kurose2, Tsutomu Araki2, Yoshinobu Aoyagi2 (1.Sumitomo Heavy Inds., 2.Ritsumeikan Univ.)

Keywords:GaN, ohmic, laser

As a new method of preventing deterioration during electrode manufacturing for the purpose of improving the quality of vertical GaN devices, We developed the LOC method that is irradiating laser only to the electrode at optimum energy and instantly alloying it to form an ohmic electrode.We succeeded in making p-type and n-type ohmic electrodes.
The greatest feature of the LOC method is to create an electrode of the required size at an optimal temperature and time at any place without damaging the device.