kentarou matsuura

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Speaker, Author, Co-Author

Sat. Mar 9, 2019 1:45 PM - 5:45 PM S221 (S221)

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[9p-S221-1~15] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

5:15 PM - 5:30 PM

[9p-S221-14] Low Contact Resistance between MoSi₂ and Sputtered MoS₂ by F.G. annealing

〇(DC)kentarou matsuura¹, Masaya Hamada¹, Takuro Sakamoto¹, Haruki Tanigawa¹, Iriya Muneta¹, Seiya Ishihara², Kuniyuki Kakushima¹, Kazuo Tsutsui¹, Atsushi Ogura², Hitoshi Wakabayashi¹ (1.Tokyo Tech, 2.Meiji Univ)