Yuki Saho

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Speaker, Author, Co-Author

Sun. Mar 10, 2019 1:45 PM - 5:00 PM W631 (W631)

Oral presentation
| Code-sharing session
| 【CS.5】Code-sharing Session of 6.1 & 13.3 & 13.5

[10p-W631-1~12] CS.5 Code-sharing Session of 6.1 & 13.3 & 13.5

2:00 PM - 2:15 PM

[10p-W631-2] The effect of O₂ partial pressure during sputtering on the crystallographic and
electrical properties of HfO₂-based thin films

〇Yuki Saho¹, Kenshi Takada¹, Daisuke Kiriya¹, Takeshi Yoshimura¹, Atsushi Ashida¹, Norifumi Fujimura¹ (1.Osaka Pref. Univ.)