Shuichi Noda

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Speaker, Author, Co-Author

Sat. Mar 9, 2019 9:00 AM - 12:00 PM M114 (H114)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9a-M114-1~12] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:30 AM - 9:45 AM

[9a-M114-3] Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)

〇Shuichi Noda¹, Kazuhiro Koga², Kazumasa Nemoto¹, Yuuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-kogyo)

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