[9a-M114-1~12] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9a-M114-3] Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)

〇Shuichi Noda¹, Kazuhiro Koga², Kazumasa Nemoto¹, Yuuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-kogyo)

Keywords:minimalfab, TiN metal gate, TiN reactive sputter