MinGee Kim

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Speaker, Author, Co-Author

Sun. Mar 10, 2019 1:45 PM - 5:00 PM W631 (W631)

Oral presentation
| Code-sharing session
| 【CS.5】Code-sharing Session of 6.1 & 13.3 & 13.5

[10p-W631-1~12] CS.5 Code-sharing Session of 6.1 & 13.3 & 13.5

2:15 PM - 2:30 PM

▲ [10p-W631-3] The influence of sputtering condition for ferroelectric HfO₂ directly deposited on Si(100) by RF magnetron sputtering

〇MinGee Kim¹, Masakazu Kataoka¹, Rengie Mark D. Mailig¹, Shun-ichiro Ohmi¹ (1.Tokyo Tech.)