Hitoshi Kumagai

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PA5 (PA)

Poster presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11a-PA5-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:30 AM - 11:30 AM

[11a-PA5-10] Cryo- etching of silicon oxide film by low-energy electron irradiation generated by DC discharge on NF3 condensation layer formed on SiO2 substrate.

〇Hitoshi Kumagai¹ (1.Yamanashi Univ.)