9:30 AM - 11:30 AM
[11a-PA5-10] Cryo- etching of silicon oxide film by low-energy electron irradiation generated by DC discharge on NF3 condensation layer formed on SiO2 substrate.
Keywords:etching, low temperature, plasma
Poster presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Mon. Mar 11, 2019 9:30 AM - 11:30 AM PA5 (PA)
9:30 AM - 11:30 AM
Keywords:etching, low temperature, plasma