Takuya Nagura

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PB2 (PB)

Poster presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11a-PB2-1~10] 13.3 Insulator technology

9:30 AM - 11:30 AM

[11a-PB2-10] The physical origin of the suppression of hole leakage by Hf incorporation in AlON

〇(M2)Takuya Nagura¹, Kenta Chokawa¹, Masaaki Araidai^1,2, Takuji Hosoi³, Heiji Watanabe³, Atsushi Oshiyama², Kenji Shiraishi^1,2 (1.Graduate School of Engineering, Nagoya Univ., 2.IMaSS, Nagoya Univ., 3.Graduate School of Engineering, Osaka Univ.)

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