Akira Toriumi

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:15 PM - 5:15 PM M136 (H136)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11p-M136-1~14] 13.3 Insulator technology

4:30 PM - 4:45 PM

[11p-M136-12] Oxidation mechanism and film properties of GeO₂ oxidized in high-pressure O₂

Xu Wang¹, Tomonori Nishimura¹, 〇Akira Toriumi¹ (1.The Univ. of Tokyo)