HuaHsuan Chen

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:15 PM - 5:15 PM M136 (H136)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11p-M136-1~14] 13.3 Insulator technology

1:30 PM - 1:45 PM

▲ [11p-M136-2] High quality silicon dioxide by low temperature neutral beam enhanced atomic layer deposition

〇HuaHsuan Chen¹, Daisuke Ohori¹, Takuya Ozaki¹, Mitsuya Utsuno², Tomohiro Kubota², Toshihisa Nozawa², Seiji Samukawa^1,3 (1.IFS, Tohoku Univ., 2.ASM Japan K.K., 3.AIMR, Tohoku Univ.)

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