Eiji Kusano

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Speaker, Author, Co-Author

Tue. Mar 12, 2019 9:00 AM - 12:45 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:45 AM - 12:00 PM

[12a-W641-11] Suppression of film resputtering and damages in MgF₂-Ar-CF₄ non-reactive and Mg-CF₄ reactive sputtering by using a double grid retarding electrodes

〇Eiji Kusano¹ (1.Kanazawa Inst.Technol.)