Masayuki Nakamura

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Speaker, Author, Co-Author

Tue. Mar 12, 2019 9:00 AM - 12:45 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

12:00 PM - 12:15 PM

△ [12a-W641-12] The density measurement of ground-state nitrogen-atom on TiN film deposition process using high power impulse magnetron sputtering

〇(M1)Masayuki Nakamura¹, Keigo Takeda¹, Takayuki Ohta¹ (1.Meijo Univ.)