12:00 PM - 12:15 PM
△ [12a-W641-12] The density measurement of ground-state nitrogen-atom on TiN film deposition process using high power impulse magnetron sputtering
Keywords:HiPIMS, nitrogen atom, TiN
A ground-state nitrogen-atom density was measured with vacuum ultraviolet absorption spectroscopy employing micro hollow cathode lamp as a light source, in Ti - HiPIMS plasma using N2/Ar gases for TiN hard coating application. Absorption intensity, which means nitrogen atom density, was proportionally increased with applied voltage and it is indicated that the dissociation of N2 molecule was proceeded.