Hiroto Ishii

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Speaker, Author, Co-Author

Sat. Mar 9, 2019 1:45 PM - 5:45 PM S221 (S221)

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[9p-S221-1~15] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

4:45 PM - 5:00 PM

△ [9p-S221-12] In-situ fabrication of Ge MOS structure with surface flattening RTA

〇(B)Hiroto Ishii^1,2, Hiroyuki Ishii², Wen Hsin Chang², Yukinori Morita², Akira Endou¹, Hiroki Fufishiro¹, Tatsurou Maeda^1,2 (1.TUS, 2.AIST)