[10a-PB2-1~18] 13.2 Exploratory Materials, Physical Properties, Devices

[10a-PB2-4] Fluorination treatment of CaSi₂ thin films grown on Si(111)

〇Kenji Ito¹, Tetsu Ohsuna¹, Hideyuki Nakano¹ (1.Toyota CRDL)

Keywords:calcium silicide, silicene, fluorination treatment

Fluorination treatment of CaSi₂ thin film grown on Si(111) substrate was examined using fluorochemical ionic liquid to fabricate silicene sandwiched by calcium fluoride. By covering the surface of CaSi₂ film with SiO₂, the reaction between the CaSi₂ film surface and the ionic liquid was suppressed, and the lateral diffusion of fluorine was expected to fabricate the silicene structure.