[10a-W323-1~9] 6.4 Thin films and New materials

[10a-W323-1] Stability of very thin Al, Ti layer deposited Ag thin films under high humidity

Eita Kudo¹, 〇Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Kyung Ho Kim¹, Mai Hayamizu², Hiroshi Murotani² (1.Kitami Inst. of Tech., 2.Tokai Univ.)

Keywords:Ag thin film, high humidity, surface nanolayer