[10a-W611-1~9] 16.3 Bulk, thin-film and other silicon-based solar cells

[10a-W611-2] Activation mechanism of passivation effect at the ALD-TiO_x/SiO_x/c-Si heterointerface ~The impact of effusion of hydrogen atoms~

Takeya Mochizuki¹, 〇Kazuhiro Gotoh¹, Tomohiko Hojo², Yasuyoshi Kurokawa¹, Eiji Akiyama², Noritaka Usami¹ (1.Graduate School of Eng. Nagoya Univ., 2.IMR Tohoku Univ.)

Keywords:titanium oxide, passivation, atomic layer deposition