The 66th JSAP Spring Meeting, 2019

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Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[10a-W631-1~12] 3.7 Laser processing

Sun. Mar 10, 2019 9:00 AM - 12:15 PM W631 (W631)

Teppei Nishi(Toyota Central R&D Labs), Mizue Mizoshiri(Nagaoka Univ. Tech.)

11:00 AM - 11:15 AM

[10a-W631-8] Formation of curve pattern beyond diffraction limit on photoresist by laser drawing exposure method using coaxial interference pattern of optical vortices

〇(M1)Takuya Hizatsuki1, Moritsugu Sakamoto1, Kohei Noda1, Tomoyuki Sasaki1, Nobuyuki Kawatsuki2, Kohei Goto3, Hiroshi Ono1 (1.Nagaoka Univ. of Technol., 2.Univ. of Hyogo, 3.Nissan Chemical Corp.)

Keywords:optical vortex, photolithography