The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

13 Semiconductors » 13.9 Compound solar cells

[10p-W321-1~16] 13.9 Compound solar cells

Sun. Mar 10, 2019 1:15 PM - 5:30 PM W321 (W321)

Shogo Ishizuka(AIST), Hisashi Miyazaki(National Defense Academy)

2:30 PM - 2:45 PM

[10p-W321-6] Effect of Annealing Temperature in H2S-free Sulfurization Method for CIS Fabrication

〇(M1)Dwinanri Egyna1, Kazuyoshi Nakada1, Akira Yamada1 (1.Tokyo Tech)

Keywords:CIS solar cell, Sulfurization

The effect of annealing temperature in sulfurization process to fabricate CIS was investigated. The CIS was formed through reaction between sulphur and a precursor Cu-In layer. The annealing temperature was varied between from 300°C to 600°C. The samples were evaluated through XRD, SEM, and EDS measurements. Peaks of CuInS2 were found in the XRD results with increase of intensity on higher annealing temperature. Cu2-xS was also found in the samples, suspected to form during the cooling process following annealing.The effect of the annealing temperature on the film adhesiveness was also investigated. Although sulfur and the precursor reacted better in higher temperature, the film adhesiveness decreased for each temperature increment.