The 66th JSAP Spring Meeting, 2019

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[10p-W323-1~16] 6.4 Thin films and New materials

Sun. Mar 10, 2019 1:45 PM - 6:15 PM W323 (W323)

Hiroaki Nishikawa(Kindai Univ.), Akira Ohtomo(Tokyo Tech)

3:45 PM - 4:00 PM

△ [10p-W323-8] Comparison of characteristics of Ag thin films deposited in different sputtering gases

〇Ryosuke Sagara1, Midori Kawamura1, Takayuki Kiba1, Yoshio Abe1, KyungHo Kim1 (1.Kitami Inst. of Tech)

Keywords:Ag thin film, sputter gas, Kr