Nitriding treatment by Active Screen Plasma and its evaluation Ⅲ

Susumu Ichimura; Ippei Tsuru; Daichi Ohkubo; Hideaki Matsuo; Mineo Goto

Presentation information

Poster presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11a-PA5-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PA5 (PA)

9:30 AM - 11:30 AM

[11a-PA5-5] Nitriding treatment by Active Screen Plasma and its evaluation Ⅲ

〇(PC)Susumu Ichimura¹, Ippei Tsuru², Daichi Ohkubo², Hideaki Matsuo², Mineo Goto² (1.Nagoya Industries Promotion Corporation, 2.NAKANIHON-RO KOGYO CO., LTD.)

Keywords:Plasma, Nitriding treatment, Synchrotron

We have been studying nitriding by plasma for the purpose of improving the hardness of steel. It was found that the hardness of the steel surface can be freely controlled by plasma nitriding conditions.