A study on pillar-shaped capacitance-detection electrodes<br />by the multi-layer metal technology

Ken Atsumi; Shota Otobe; Tatsuya Koga; Takashi Ichikawa; Daisuke Yamane; Shin-ichi Iida; Hiroyuki Ito; Noboru Ishihara; Masato Sone; Katsuyuki Machida; Kazuya Masu

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[11a-W934-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Mon. Mar 11, 2019 9:00 AM - 11:45 AM W934 (W934)

Hiromu Ishii(Toyohashi Univ. of Tech.), Minoru Sasaki(Toyota Tech. Inst.)

9:00 AM - 9:15 AM

△ [11a-W934-1] A study on pillar-shaped capacitance-detection electrodes
by the multi-layer metal technology

〇(M1)Ken Atsumi¹, Shota Otobe¹, Tatsuya Koga¹, Takashi Ichikawa¹, Daisuke Yamane¹, Shin-ichi Iida², Hiroyuki Ito¹, Noboru Ishihara¹, Masato Sone¹, Katsuyuki Machida¹, Kazuya Masu¹ (1.Tokyo Tech, 2.NTT-AT)

Keywords:MEMS accelerometer

« Previous in this session
Next in this session »

▲

Presentation information

[11a-W934-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

△ [11a-W934-1] A study on pillar-shaped capacitance-detection electrodesby the multi-layer metal technology

△ [11a-W934-1] A study on pillar-shaped capacitance-detection electrodes
by the multi-layer metal technology