The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[11p-70A-1~17] 15.6 Group IV Compound Semiconductors (SiC)

Mon. Mar 11, 2019 1:00 PM - 5:30 PM 70A (70th Anniversary Auditorium)

Koichi Murata(CRIEPI), Tomoaki Furusho(Mitsubishi Electric)

5:00 PM - 5:15 PM

[11p-70A-16] Gate-bias control of single photon sources in channel region of 4H-SiC MOSFET (II)

〇(D)Yuta Abe1,2, Takahide Umeda1, Mitsuo Okamoto3, Shinsuke Harada3, Shin-ichiro Sato2, Yuichi Yamazaki2, Takeshi Ohshima2 (1.Univ. of Tsukuba, 2.QST, 3.AIST)

Keywords:MOS interface, single photon source, defect

Single photon source (SPS) which emits one photon for one luminescent event is studied as an application for quantum cryptography and quantum sensing. Silicon Carbide (SiC) has various SPSs (for example, silicon vacancy) and we found very bright SPSs in channel region of 4H-SiC MOSFET at room temperature. The SPSs we found changed their luminescent intensity by gate voltage. They included 2 types of SPS which the luminescent intensity is increased and decreased. In this study, we investigate the differences between the 2 types of SPS.