The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[11p-70A-1~17] 15.6 Group IV Compound Semiconductors (SiC)

Mon. Mar 11, 2019 1:00 PM - 5:30 PM 70A (70th Anniversary Auditorium)

Koichi Murata(CRIEPI), Tomoaki Furusho(Mitsubishi Electric)

1:45 PM - 2:00 PM

[11p-70A-4] Optimization of growth condition of SiC solution growth by the predication model constructed by machine learning for larger diameter

Toru Ujihara1,2,4, Yosuke Tsunooka2,3, Tomoki Endo2, Can Zhu1, Kentaro Kutsukake4, Taka Narumi5, Takeshi Mitani3, Tomohisa Kato3, Miho Tagawa1,2, Shunta Harada1,2 (1.IMaSS Nagoya Univ., 2.Nagoya Univ., 3.AIST, 4.RIKEN, 5.VBL Nagoya Univ.)

Keywords:crystal growth, machine learning, optimization

We successfully made the high-speed prediction model for temperature-, concentration- and flow velocity-distributions in SiC solution gowth by the combination of machine learning and CFD simulation. In this study, we tried to optimize the growth conditions for 85mm crystal using the prediction model.