The 66th JSAP Spring Meeting, 2019

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[11p-M136-1~14] 13.3 Insulator technology

Mon. Mar 11, 2019 1:15 PM - 5:15 PM M136 (H136)

Takanobu Watanabe(Waseda Univ.), Koji Kita(Univ. of Tokyo), Kiyoteru Kobayashi(Tokai Univ.)

1:45 PM - 2:00 PM

[11p-M136-3] Charge trapping characteristics in SiO2 during application of electric stress at high temperature

〇(M2)Takeshi Nanke1, Ryu Hasunuma1 (1.Univ. of Tuskuba)

Keywords:trap, interface state