The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[11p-S422-1~10] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Mon. Mar 11, 2019 1:45 PM - 5:00 PM S422 (S422)

Hidetoshi Suzuki(Miyazaki Univ.), Kou Matsumoto(Taiyo Nippon Sanso)

3:45 PM - 4:00 PM

[11p-S422-6] Optical property control of strain-engineered stacked InAs quantum dots
by modulated interlayers

〇(M2)Mikihito Suzuki1, Kenichi Shimomura1, Itaru Kamiya1 (1.Toyota Tech. inst.)

Keywords:InAs quantum dots, strain relaxation, electronic states

We have already shown luminescence exceeding 1.55 μm from InAs QDs on GaAs by strain relaxation at both RT an 4K. However, in this structure, we need to thicken the cap InGaAs thin film layer for device applications.
In addition, we reported that the strain can be further relaxed by using InGaAs as the sublying layer resulting in redshift of PL. However, the details of the role of the InGaAs layer are not clear.Here, we report the change in the optical property of QDs in a structure with modulated interlayers.