The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.7 Crystal characterization, impurities and crystal defects

[12a-M111-1~9] 15.7 Crystal characterization, impurities and crystal defects

Tue. Mar 12, 2019 9:30 AM - 12:00 PM M111 (H111)

Takuo Sasaki(QST), RYOUTA SUEWAKA(SUMCO)

10:15 AM - 10:30 AM

[12a-M111-4] Oxygen Transport Process in Silicon Melt under Inhomogeneous Magnetic Fields

Koichi Kakimoto1, Liu Xin1, Satoshi Nakano1, Yoshiji Miyamura1, Hirofumi Harada1, Shin-ichi Nishizawa1 (1.RIAM, Kyushu Univ.)

Keywords:semiconductor, Silicon, Crystal growth

This paper reports the effect of inhomogeneous distribution of transverse magnetic fields on oxygen transport in silicon melt during CZ growth. Relative position between the inhomogeneous magnetic field and silicon melt modifies melt flow, then oxygen transport is also modified. The details will be presented.